Experimental Study of Interfacial Fracture Toughness in a SiNx/PMMA Barrier Film
Author:
Affiliation:
1. School of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/am301880y
Reference44 articles.
1. Al2O3/ZrO2Nanolaminates as Ultrahigh Gas-Diffusion Barriers-A Strategy for Reliable Encapsulation of Organic Electronics
2. Gas Diffusion Barriers on Polymers Using Multilayers Fabricated by Al2O3 and Rapid SiO2 Atomic Layer Deposition
3. A study of thin film encapsulation on polymer substrate using low temperature hybrid ZnO/Al2O3 layers atomic layer deposition
4. Deposition and permeation properties of SiNX/parylene multilayers on polymeric substrates
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