Atomic Layer Deposition of Molybdenum Nitride from Bis(tert-butylimido)-bis(dimethylamido)molybdenum and Ammonia onto Several Types of Substrate Materials with Equal Growth per Cycle-Reference-Cited by-同舟云学术

Atomic Layer Deposition of Molybdenum Nitride from Bis(tert-butylimido)-bis(dimethylamido)molybdenum and Ammonia onto Several Types of Substrate Materials with Equal Growth per Cycle

Published:2006-12-14 Issue:2 Volume:19 Page:263-269
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Miikkulainen Ville¹,Suvanto Mika¹,Pakkanen Tapani A.¹

Affiliation:

1. Department of Chemistry, University of Joensuu, P.O. Box 111, FIN-80101 Joensuu, Finland

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm0620279

Reference48 articles.

1. Transition Metal Carbides, Nitrides, and Carbonitrides

2. Chemical vapor deposition of titanium, zirconium, and hafnium nitride thin films

3. Ti–N phases formed by reactive ion plating

4. Design and evaluation of tribological coatings

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