Electron Induced Surface Reactions of the Organometallic Precursor Trimethyl(methylcyclopentadienyl)platinum(IV)-Reference-Cited by-同舟云学术

Electron Induced Surface Reactions of the Organometallic Precursor Trimethyl(methylcyclopentadienyl)platinum(IV)

Published:2009-01-21 Issue:6 Volume:113 Page:2487-2496
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Wnuk Joshua D.¹,Gorham Justin M.¹,Rosenberg Samantha G.¹,van Dorp Willem F.¹,Madey Theodore E.¹,Hagen Cornelis W.¹,Fairbrother D. Howard¹

Affiliation:

1. Department of Chemistry, Johns Hopkins University, Baltimore, Maryland 21218, Department of Physics and Astronomy, and Laboratory for Surface Modification, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08854-8019, and Delft University of Technology, Faculty of Applied Sciences, Lorentzweg 1, 2628CJ Delft, The Netherlands

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp807824c

Reference73 articles.

1. Fabrication of 5 nm gap pillar electrodes by electron-beam Pt deposition

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3. In situprobing of the growth and morphology in electron-beam-induced deposited nanostructures

4. Effect of Electron Beam-Induced Deposition and Etching Under Bias

5. Gas-assisted focused electron beam and ion beam processing and fabrication

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