Atomic Layer Deposition of Antimony and its Compounds Using Dechlorosilylation Reactions of Tris(triethylsilyl)antimony
Author:
Affiliation:
1. Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014 University of Helsinki, Finland
2. Accelerator Laboratory, Department of Physics, University of Helsinki, P.O. Box 43, FI-00014 University of Helsinki, Finland
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm102904f
Reference46 articles.
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3. Ritala, M.; Niinistö, J.Chemical Vapour Deposition: Precursors, Processes and Applications;Jones, A. C.; Hitchman, M. L., Eds.Royal Society of Chemistry:Cambridge, U.K., 2009; Chapter 4, pp158−206.
4. Industrial Applications of Atomic Layer Deposition
5. Synthesis and Surface Engineering of Complex Nanostructures by Atomic Layer Deposition
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