Characterization of X-ray Induced Damage in Alkanethiolate Monolayers by High-Resolution Photoelectron Spectroscopy-Reference-Cited by-同舟云学术

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Characterization of X-ray Induced Damage in Alkanethiolate Monolayers by High-Resolution Photoelectron Spectroscopy

Published:2000-12-09 Issue:1 Volume:17 Page:8-11
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Heister K.¹,Zharnikov M.¹,Grunze M.¹,Johansson L. S. O.²,Ulman A.³

Affiliation:

1. Angewandte Physikalische Chemie, Universität Heidelberg, Im Neuenheimer Feld 253, D-69120 Heidelberg, Germany

2. Department of Physics, Karlstad University, S-65188 Karlstad, Sweden

3. Department of Chemistry and the NSF MRSEC for Polymers at Engineered Interfaces, Polytechnic University, Brooklyn, New York 11201

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la001101d

Reference22 articles.

1. Formation and Structure of Self-Assembled Monolayers

2. X-ray Damage to CF 3 CO 2 -Terminated Organic Monolayers on Si/Au: Principal Effect of Electrons

3. Electron-Beam-Induced Damage in Self-Assembled Monolayers

4. X-ray and Low Energy Electron Induced Damage in Alkanethiolate Monolayers on Au-substrates

5. Modification of self-assembled monolayers of alkanethiols on gold by ionizing radiation

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