Metal-Organic Framework ZIF-8 Films As Low-κ Dielectrics in Microelectronics-Reference-Cited by-同舟云学术

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Metal-Organic Framework ZIF-8 Films As Low-κ Dielectrics in Microelectronics

Published:2012-12-24 Issue:1 Volume:25 Page:27-33
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Eslava Salvador¹,Zhang Liping²,Esconjauregui Santiago³,Yang Junwei³,Vanstreels Kris²,Baklanov Mikhail R.²,Saiz Eduardo¹

Affiliation:

1. Centre for Advanced Structural Ceramics, Department of Materials, Imperial College London, SW7 2BP, London, United Kingdom

2. IMEC, Kapeldreef 75, Leuven 3001, Belgium

3. Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm302610z

Reference41 articles.

1. Low Dielectric Constant Materials

2. Low dielectric constant materials for microelectronics

3. Low–Dielectric Constant Insulators for Future Integrated Circuits and Packages

4. International Technology Roadmap of Semiconductors; 2009, http://www.itrs.net.

5. Ultraviolet-Assisted Curing of Polycrystalline Pure-Silica Zeolites: Hydrophobization, Functionalization, and Cross-Linking of Grains

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