Suppressing Nucleation in Metal–Organic Chemical Vapor Deposition of MoS2 Monolayers by Alkali Metal Halides-Reference-Cited by-同舟云学术

Suppressing Nucleation in Metal–Organic Chemical Vapor Deposition of MoS2 Monolayers by Alkali Metal Halides

Author:

Kim HoKwon¹²,Ovchinnikov Dmitry¹²,Deiana Davide³,Unuchek Dmitrii¹²,Kis Andras¹²^ORCID

Affiliation:

1. Electrical Engineering Institute, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland

2. Institute of Materials Science and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland

3. Interdisciplinary Center for Electron Microscopy (CIME), École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland

Funder

FP7 Information and Communication Technologies

Schweizerischer Nationalfonds zur F?rderung der Wissenschaftlichen Forschung

H2020 Future and Emerging Technologies

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

Reference57 articles.

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