Replacing Metals with Oxides in Metal-Assisted Chemical Etching Enables Direct Fabrication of Silicon Nanowires by Solution Processing-Reference-Cited by-同舟云学术

Replacing Metals with Oxides in Metal-Assisted Chemical Etching Enables Direct Fabrication of Silicon Nanowires by Solution Processing

Author:

Gayrard Maxime¹,Voronkoff Justine¹,Boissière Cédric¹^ORCID,Montero David²,Rozes Laurence¹,Cattoni Andrea³,Peron Jennifer⁴^ORCID,Faustini Marco¹^ORCID

Affiliation:

1. Laboratoire Chimie de la Matière Condensée de Paris (LCMCP), Collège de France, CNRS, Sorbonne Université, F-75005 Paris, France

2. Institut des Matériaux de Paris Centre (IMPC FR 2482), Sorbonne Université, UFR de Chimie Campus Jussieu, 75252 Paris, France

3. Centre de Nanosciences et de Nanotechnologies (C2N), CNRS UMR 9001, Université Paris-Saclay, 91120 Palaiseau, France

4. ITODYS, CNRS, UMR 7086, Université de Paris, 15 Rue J-A de Baïf, F-75013 Paris, France

Funder

Agence Nationale de la Recherche

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

Reference48 articles.

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