Efficient Hydrogenated Amorphous Silicon Thin-Film Solar Cells Using Zinc Oxide Deposited by Atomic Layer Deposition as a Protective Interfacial Layer-Reference-Cited by-同舟云学术

Efficient Hydrogenated Amorphous Silicon Thin-Film Solar Cells Using Zinc Oxide Deposited by Atomic Layer Deposition as a Protective Interfacial Layer

Published:2012-10-29 Issue:44 Volume:116 Page:23231-23235
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Lee Young-Joo¹,Choi Min-Seung¹,Kim Dong-Ho¹,Kim Chang-Su¹,Song Myung-Kwan¹,Kang Jae-Wook¹,Jeong Yongsoo¹,Nam Kee-Seok¹,Park Sung-Gyu¹,Kwon Se-Hun²,Ryu Seung Yoon³,Kwon Jung-Dae¹

Affiliation:

1. Advanced Functional Thin Films Department, Korea Institute of Materials Science (KIMS), Changwon, Gyeongnam, 641-831, Republic of Korea

2. National Core Research Center for Hybrid Materials Solution, Pusan National University, Busan 609-735, Republic of Korea

3. Department of Information Display, Sunmoon University, Asan, Chungnam, 336-708, Republic of Korea

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp306360h

Reference18 articles.

1. Degradation studies of transparent conducting oxide: a substrate for microcrystalline silicon thin film solar cells

2. The role of ZnO:Al films in the performance of amorphous-silicon based tandem solar cells

3. ITO surface ball formation induced by atomic hydrogen in PECVD and HW-CVD tools

4. The degradation of fluorine doped tin oxide films in a hydrogen plasma

5. Reduction of Tin Oxide by Hydrogen Radicals

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