Measurements of Line Strengths in the 2ν1 Band of the HO2 Radical Using Laser Photolysis/Continuous Wave Cavity Ring-Down Spectroscopy (cw-CRDS)
Author:
Affiliation:
1. Physico-Chimie des Processus de Combustion et de l'Atmosphère (PC2A), CNRS UMR 8522, Université des Sciences et Technologies de Lille, 59655 Villeneuve d'Ascq Cedex, France
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp0703307
Reference37 articles.
1. Kinetics of the Reaction C2H5 + HO2 by Time-Resolved Mass Spectrometry
2. Experimental and ab Initio Study of the HO2·CH3OH Complex: Thermodynamics and Kinetics of Formation
3. Formation of HO2 and OH in photolytically initiated oxidation of dimethyl ether
4. Kinetics of HO2+ HO2→ H2O2+ O2: Implications for Stratospheric H2O2
Cited by 67 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Spatially- and time-resolved measurements of HO2 radicals in a ns pulse atmospheric pressure plasma jet;Plasma Sources Science and Technology;2024-03-01
2. Calculated and Empirical Values of Vibronic Transition Dipole Moments of Reactive Chemical Intermediates for Determination of Concentrations;The Journal of Physical Chemistry A;2023-05-22
3. Formation and consumption of HO2 radicals in ns pulse O2–He plasmas over a liquid water surface;Plasma Sources Science and Technology;2022-11-01
4. Portable cavity ring-down spectrometer for an HO2 radical measurement: instrument’s performance and potential improvement using a narrow linewidth laser;Optics Express;2022-09-26
5. Self-Reaction of Acetonyl Peroxy Radicals and Their Reaction with Cl Atoms;The Journal of Physical Chemistry A;2022-07-06
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3