Influence of Diborane Flow Rate on the Structure and Stability of CVD Boron Nitride Films-Reference-Cited by-同舟云学术

Influence of Diborane Flow Rate on the Structure and Stability of CVD Boron Nitride Films

Published:1996-01-01 Issue:6 Volume:100 Page:2148-2153
ISSN:0022-3654
Container-title:The Journal of Physical Chemistry
language:en
Short-container-title:J. Phys. Chem.

Author:

Gómez-Aleixandre C.¹,Essafti A.¹,Fernández M.¹,Fierro J. L. G.¹,Albella J. M.¹

Affiliation:

1. Instituto Cierncia de Materiales, CSIC, Universidad Autónoma C-12, Cantoblanco, 28049 Madrid, Spain, and Instituto de Catálisis y Petroleoquímica, CSIC, Cantoblanco, 28049 Madrid, Spain

Publisher

American Chemical Society (ACS)

Subject

Physical and Theoretical Chemistry,General Engineering

Link

https://pubs.acs.org/doi/pdf/10.1021/jp951200d

Reference22 articles.

1. Preparation, properties and applications of boron nitride thin films

2. Preparation and Properties of Thin Film Boron Nitride

3. CVD‐BN for Boron Diffusion in Si and Its Application to Si Devices

4. Effect of Growth Parameters on the CVD of Boron Nitride and Phosphorus‐Doped Boron Nitride

5. Reaction of diborane and ammonia gas mixtures in a chemical vapor deposition hot-wall reactor

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