Mechanistic Study of Nucleation Enhancement in Atomic Layer Deposition by Pretreatment with Small Organometallic Molecules
Author:
Affiliation:
1. Department of Chemical Engineering, Stanford University, Stanford, California 94305-5025, United States
Funder
U.S. Department of Energy
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.9b03826
Reference61 articles.
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5. Atomistic Processes in the Early Stages of Thin-Film Growth
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