Thermodynamic Theory of Silicon Chemical Vapor Deposition-Reference-Cited by-同舟云学术

Thermodynamic Theory of Silicon Chemical Vapor Deposition

Published:2021-03-10 Issue:6 Volume:33 Page:2147-2154
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Tomasini Pierre¹^ORCID

Affiliation:

1. Silicon Products Group, Applied Materials, 974 East Arques Avenue, Sunnyvale, California 94085, United States

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.0c04901

Reference30 articles.

1. Epitaxial Silicon Technology

2. Silicon Epitaxy

3. Crippa, D.; Rode, D. L.; Masi, M.; Rinaldi, A. M., Eds. Silicon Epitaxy, Semiconductors and Semimetals; Academic Press: 2001; Vol. 72, Chapters 1–11, pp 1–457.

4. Wolf, S.; Tauber, R. N. Silicon Processing for the VLSI Era, Vol. 1, Process Technology; Lattice Press: Sunset Beach, CA, 1999; Chapter 5, pp 124–160.

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