1,5-Pentanediol as an Oxygen Precursor for Atomic Layer Deposition of Zinc Oxide Thin Films
Author:
Affiliation:
1. Department of Chemical Engineering, Konkuk University, 120 Neungdong-Ro, Gwangjin-Gu, Seoul 143-701, Korea
Funder
Konkuk University
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.6b05300
Reference21 articles.
1. Atomic Layer Deposition: An Overview
2. Atomic Layer Deposition for Semiconductors
3. Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing
4. Atomic layer deposition (ALD): from precursors to thin film structures
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