Atomic Layer Deposition of Ruthenium Dioxide Based on Redox Reactions between Alcohols and Ruthenium Tetroxide-Reference-Cited by-同舟云学术

Atomic Layer Deposition of Ruthenium Dioxide Based on Redox Reactions between Alcohols and Ruthenium Tetroxide

Published:2022-09-21 Issue:19 Volume:34 Page:8946-8958
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Poonkottil Nithin¹^ORCID,Minjauw Matthias M.¹^ORCID,Werbrouck Andreas¹^ORCID,Checchia Stefano²,Solano Eduardo³^ORCID,Nisula Mikko¹^ORCID,Franquet Alexis⁴,Detavernier Christophe¹^ORCID,Dendooven Jolien¹^ORCID

Affiliation:

1. Department of Solid State Sciences, COCOON, Ghent University, Krijgslaan 281/S1, B-9000 Ghent, Belgium

2. ESRF Synchrotron, ID15A Beamline, Avenue des Martyrs, CS40220, 38043 Grenoble, France

3. NCD-SWEET Beamline, ALBA Synchrotron Light Source, Cerdanyola del Valles 08290, Spain

4. IMEC, Kapeldreef 75, B-3001 Heverlee, Leuven, Belgium

Funder

H2020 Marie Sklodowska-Curie Actions

Universiteit Gent

Fonds Wetenschappelijk Onderzoek

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.2c02292

Reference100 articles.

1. Improvement in the leakage current characteristic of metal-insulator-metal capacitor by adopting RuO2 film as bottom electrode

2. Recent Progress in Ruthenium Oxide‐Based Composites for Supercapacitor Applications

3. Electrical Transport Properties of IrO2and RuO2

4. Physical electrochemistry of ceramic oxides

5. Hydrous Ruthenium Oxide as an Electrode Material for Electrochemical Capacitors

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