Low-Temperature Steam Annealing of Metal Oxide Thin Films from Aqueous Precursors: Enhanced Counterion Removal, Resistance to Water Absorption, and Dielectric Constant
Author:
Affiliation:
1. Department of Chemistry & Biochemistry and Materials Science Institute, University of Oregon, Eugene, Oregon 97403, United States
2. Department of Chemistry, Oregon State University, 153 Gilbert Hall, Corvallis, Oregon 97331, United States
Funder
Division of Chemistry
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.7b03585
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1. Scalability and homogeneity of slot die-coated metal oxide semiconductor for TFTs
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