Rational Design and Fabrication of Block Copolymer Templated Hafnium Oxide Nanostructures
Author:
Affiliation:
1. The Wolfson Department of Chemical Engineering, Technion, Haifa 3200003, Israel
2. The Andrew and Erna Viterbi Faculty of Electrical and Computer Engineering, Technion, Haifa 3200003, Israel
Funder
Israel Science Foundation
Publisher
American Chemical Society (ACS)
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.3c02836
Reference64 articles.
1. High-K materials and metal gates for CMOS applications
2. Dielectric properties of dysprosium- and scandium-doped hafnium dioxide thin films
3. Electronic properties of hafnium oxide: A contribution from defects and traps
4. Optical properties of a-HfO2 thin films
5. A study on structural, optical and hydrophobic properties of oblique angle sputter deposited HfO2 films
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