Novel Metal Silicide Thin Films by Design via Controlled Solid-State Diffusion-Reference-Cited by-同舟云学术

Novel Metal Silicide Thin Films by Design via Controlled Solid-State Diffusion

Published:2015-06-05 Issue:12 Volume:27 Page:4247-4253
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Streller Frank¹,Agarwal Rahul¹,Mangolini Filippo¹,Carpick Robert W.¹²

Affiliation:

1. Department of Materials Science and Engineering, University of Pennsylvania, 3231 Walnut Street, Philadelphia, Pennsylvania 19104, United States

2. Department of Mechanical Engineering and Applied Mechanics, University of Pennsylvania, 220 South 33rd Street, Philadelphia, Pennsylvania 19104, United States

Funder

European Commission Directorate-General for Research and Innovation

Division of Civil, Mechanical and Manufacturing Innovation

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.5b01413

Reference37 articles.

1. Silicides: Fundamentals and Applications

2. Phase Formation and Morphology of Nickel Silicide Thin Films Synthesized by Catalyzed Chemical Vapor Reaction of Nickel with Silane

3. Low Schottky barrier of rare‐earth silicide onn‐Si

4. Metal silicides: An integral part of microelectronics

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