What Determines the Electrochemical Properties of Nitrogenated Amorphous Carbon Thin Films?

Author:

Etula Jarkko1ORCID,Wester Niklas1ORCID,Liljeström Touko1,Sainio Sami23,Palomäki Tommi1,Arstila Kai4,Sajavaara Timo4,Koskinen Jari1,Caro Miguel A.5ORCID,Laurila Tomi5ORCID

Affiliation:

1. Department of Chemistry and Materials Science, School of Chemical Engineering, Aalto University, 02150 Espoo, Finland

2. Stanford Synchrotron Radiation Lightsource, SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States

3. Microelectronics Research Unit, Faculty of Information Technology and Electrical Engineering, University of Oulu, 90570 Oulu, Finland

4. Department of Physics, University of Jyväskylä, 40500 Jyväskylä, Finland

5. Department of Electrical Engineering and Automation, School of Electrical Engineering, Aalto University, 02150 Espoo, Finland

Funder

Walter Ahlstr??min S????ti??

H2020 Marie Sk??odowska-Curie Actions

Business Finland

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

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