Carbon Incorporation in MOCVD of MoS2 Thin Films Grown from an Organosulfide Precursor-Reference-Cited by-同舟云学术

Carbon Incorporation in MOCVD of MoS2 Thin Films Grown from an Organosulfide Precursor

Published:2021-05-24 Issue:12 Volume:33 Page:4474-4487
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Schaefer Christian M.¹^ORCID,Caicedo Roque José M.¹,Sauthier Guillaume¹,Bousquet Jessica¹,Hébert Clément¹,Sperling Justin R.¹^ORCID,Pérez-Tomás Amador¹,Santiso José¹^ORCID,del Corro Elena¹,Garrido Jose A.¹²^ORCID

Affiliation:

1. Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC and BIST, Campus UAB, 08193 Bellaterra, Spain

2. ICREA, 08010 Barcelona, Spain

Funder

Ministerio de Ciencia e Innovaci?n

Horizon 2020 Framework Programme

Generalitat de Catalunya

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.1c00646

Reference83 articles.

1. Beyond Graphene: Progress in Novel Two-Dimensional Materials and van der Waals Solids

2. Atomically ThinMoS2: A New Direct-Gap Semiconductor

3. Emerging Photoluminescence in Monolayer MoS2

4. Single-layer MoS2 transistors

5. Logic-in-memory based on an atomically thin semiconductor

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Sample preparation techniques for MoS2: Insights from Auger electron spectroscopy;Vacuum;2024-11

2. High-Yield WS₂ Synthesis through Sulfurization in Custom-Modified Atmospheric Pressure Chemical Vapor Deposition Reactor, Paving the Way for Selective NH₃ Vapor Detection;ACS Applied Materials & Interfaces;2024-09-02

3. Few-Layer MoS₂ on a SiO₂/Si Wafer through Sulfurization Chemical Vapor Deposition with a Vaporization-Shadowing Effect;ACS Applied Nano Materials;2024-08-26

4. Large-Area Epitaxial Growth of Transition Metal Dichalcogenides;Chemical Reviews;2024-08-12

5. Large‐Scale Analysis of Defects in Atomically Thin Semiconductors using Hyperspectral Line Imaging;Small;2024-06-14