Directed Assembly of Non-equilibrium ABA Triblock Copolymer Morphologies on Nanopatterned Substrates-Reference-Cited by-同舟云学术

Directed Assembly of Non-equilibrium ABA Triblock Copolymer Morphologies on Nanopatterned Substrates

Published:2012-05-10 Issue:6 Volume:6 Page:5440-5448
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Ji Shengxiang¹,Nagpal Umang²,Liu Guoliang²,Delcambre Sean P.²,Müller Marcus³,de Pablo Juan J.²,Nealey Paul F.²

Affiliation:

1. Key Laboratory of Polymer Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, 5625 Renmin Street, Changchun 130022, China

2. Department of Chemical and Biological Engineering, University of Wisconsin, 1415 Engineering Drive, Madison, Wisconsin 53706, United States

3. Institut für Theoretische Physik, Georg-August Universität, 37073 Göttingen, Germany

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/nn301306v

Reference59 articles.

1. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates

2. Precise Control over Molecular Dimensions of Block-Copolymer Domains Using the Interfacial Energy of Chemically Nanopatterned Substrates

3. Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates

4. Dimensions and Shapes of Block Copolymer Domains Assembled on Lithographically Defined Chemically Patterned Substrates

5. Rapid Directed Assembly of Block Copolymer Films at Elevated Temperatures

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