Effects of Lateral Confinement on Order in Spherical Domain Block Copolymer Thin Films
Author:
Affiliation:
1. Departments of Chemical Engineering and Materials, University of California, Santa Barbara, Santa Barbara, California 93106
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ma0257696
Reference48 articles.
1. Nanoscale patterning using self-assembled polymers for semiconductor applications
2. Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication
3. Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography
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