Infrared and Raman Studies on Films of Organosiloxane Networks Produced by PECVD
Author:
Affiliation:
1. Instituto de Química, Universidade Estadual de Campinas, Caixa Postal 6154, CEP-13.083-970, Campinas-SP, Brazil
2. Instituto de Física “Gleb Wataglin”, Universidade Estadual de Campinas, Caixa Postal 6165, CEP-13.087-970, Campinas-SP, Brazil
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ma035297a
Reference50 articles.
1. Pulsed-PECVD Films from Hexamethylcyclotrisiloxane for Use as Insulating Biomaterials
2. Effect of siloxane chain lengths of monomers on characteristics of pervaporation membranes prepared by plasma polymerization
3. Magni, D.; Descheneaux, C.; Hollenstein, C.; Creatore, A.; Fayet, P.J. Phys.D: Appl. Phys.2001,34, 87.
4. Oxygen Plasma Resistance of Low-k Organosilica Glass Films
5. Polymerization of Organosilicones in Microwave Discharges
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