Atomic Scale Modeling of Two-Dimensional Molecular Self-Assembly on a Passivated Si Surface-Reference-Cited by-同舟云学术

Atomic Scale Modeling of Two-Dimensional Molecular Self-Assembly on a Passivated Si Surface

Published:2014-06-05 Issue:24 Volume:118 Page:12817-12825
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Copie G.¹,Makoudi Y.²,Krzeminski C.³,Chérioux F.²,Palmino F.²,Lamare S.²,Grandidier B.³,Cleri F.¹

Affiliation:

1. Institut d’Electronique, Microélectronique et Nanotechnologie (IEMN), CNRS UMR 8520, Université de Lille 1 Sciences et Technologies, Avenue Poincaré, 59652 Villeneuve d’Ascq, France

2. Institut FEMTO-ST, Université de Franche-Comté, CNRS, ENSMM, 32 avenue de l’Observatoire, 25044 Besançon cedex, France

3. Institut d’Electronique, Microélectronique et Nanotechnologie (IEMN), CNRS UMR 8520, Département ISEN, 41 bd Vauban, 59046 Lille Cedex, France

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp501955v

Reference44 articles.

1. Self-assembly and transformation of hybrid nano-objects and nanostructures under equilibrium and non-equilibrium conditions

2. Two-Dimensional Mott-Hubbard Electrons in an Artificial Honeycomb Lattice

3. Designer Dirac fermions and topological phases in molecular graphene

4. Flat Chern Band in a Two-Dimensional Organometallic Framework

5. Tailoring molecular layers at metal surfaces

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