Surface Infrared Studies of Silicon/Silicon Oxide Interfaces Derived from Hydridosilsesquioxane Clusters
Author:
Affiliation:
1. Contribution from the Department of Chemistry, The University of Michigan, Ann Arbor, Michigan 48109-1055
Publisher
American Chemical Society (ACS)
Subject
Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis
Link
https://pubs.acs.org/doi/pdf/10.1021/ja980741o
Reference37 articles.
1. Si/SiO2interface: New structures and well-defined model systems
2. Synthetic Control of Solid/Solid Interfaces: Analysis of Three New Silicon/Silicon Oxide Interfaces by Soft X-ray Photoemission
3. A New Model Silicon/Silicon Oxide Interface Synthesized fromH10Si10O15andSi(100)-2×1
4. Si 2pcore-level shifts at the Si(100)-SiO2interface: An experimental study
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