A New Perfluoropolyether-Based Hydrophobic and Chemically Resistant Photoresist Structured by Two-Photon Polymerization-Reference-Cited by-同舟云学术

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A New Perfluoropolyether-Based Hydrophobic and Chemically Resistant Photoresist Structured by Two-Photon Polymerization

Published:2012-12-18 Issue:1 Volume:29 Page:426-431
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

De Marco Carmela¹,Gaidukeviciute Arune²,Kiyan Roman²,Eaton Shane M.³,Levi Marinella¹,Osellame Roberto³,Chichkov Boris N.²,Turri Stefano¹

Affiliation:

1. Dipartimento di Chimica, Materiali e Ingegneria Chimica “Giulio Natta”, Politecnico di Milano, Piazza Leonardo da Vinci 32, 20133 Milan, Italy

2. Laser Zentrum Hannover e.V., Hollerithalle 8, D-30419 Hannover, Germany

3. Istituto di Fotonica e Nanotecnologie del CNR, Piazza Leonardo da Vinci 32, 20133 Milan, Italy

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la303799u

Reference39 articles.

1. Two-photon fabrication

2. Finer features for functional microdevices

3. Recent progress in multiphoton microfabrication

4. Three-dimensional microfabrication of materials by femtosecond lasers for photonics applications

5. Fabrication of woodpile structures by two-photon polymerization and investigation of their optical properties

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5. Synthesis and Characterization of High-Performance Polymers Based on Perfluoropolyalkyl Ethers Using an Environmentally Friendly Solvent;Langmuir;2020-08-12

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