On the Role of Carbon Radical Insertion Reactions in the Growth of Diamond by Chemical Vapor Deposition Methods-Reference-Cited by-同舟云学术

On the Role of Carbon Radical Insertion Reactions in the Growth of Diamond by Chemical Vapor Deposition Methods

Published:2009-09-24 Issue:42 Volume:113 Page:11416-11422
ISSN:1089-5639
Container-title:The Journal of Physical Chemistry A
language:en
Short-container-title:J. Phys. Chem. A

Author:

Richley James C.¹,Harvey Jeremy N.¹,Ashfold Michael N. R.¹

Affiliation:

1. School of Chemistry, University of Bristol, Cantock’s Close, Bristol BS8 1TS, U.K.

Publisher

American Chemical Society (ACS)

Subject

Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp906065v

Reference44 articles.

1. Goodwin, D. G.; Butler, J. E.InHandbook of Industrial Diamonds and Diamond Films;Prelas, M. A., Popovici, G., Bigelow, L. G., Eds.Marcel Dekker:New York, 1998; pp527−81and references therein.

2. Origin of the Reactivity on the Nonterminated (100), (110), and (111) Diamond Surfaces: An Electronic Structure DFT Study

3. Understanding the chemical vapor deposition of diamond: recent progress

4. Quantum cascade laser investigations of CH4 and C2H2 interconversion in hydrocarbon/H2 gas mixtures during microwave plasma enhanced chemical vapor deposition of diamond

5. Probing the plasma chemistry in a microwave reactor used for diamond chemical vapor deposition by cavity ring down spectroscopy

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