Rapid Degradation of the Electrical Properties of 2D MoS2 Thin Films under Long-Term Ambient Exposure-Reference-Cited by-同舟云学术

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Rapid Degradation of the Electrical Properties of 2D MoS2 Thin Films under Long-Term Ambient Exposure

Published:2021-09-09 Issue:37 Volume:6 Page:24075-24081
ISSN:2470-1343
Container-title:ACS Omega
language:en
Short-container-title:ACS Omega

Author:

Chamlagain Bhim¹^ORCID,Khondaker Saiful I.¹²

Affiliation:

1. NanoScience Technology Center and Department of Physics, University of Central Florida, Orlando, Florida 32826, United States

2. School of Electrical Engineering and Computer Science, University of Central Florida, Orlando, Florida 32826, United States

Funder

Division of Civil, Mechanical and Manufacturing Innovation

Publisher

American Chemical Society (ACS)

Subject

General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acsomega.1c03522

Reference40 articles.

1. Surface-Energy-Assisted Perfect Transfer of Centimeter-Scale Monolayer and Few-Layer MoS2 Films onto Arbitrary Substrates

2. 2D MoS2 as an efficient protective layer for lithium metal anodes in high-performance Li–S batteries

3. Wafer-scale MoS2 thin layers prepared by MoO3 sulfurization

4. Towards a uniform and large-scale deposition of MoS2nanosheets via sulfurization of ultra-thin Mo-based solid films

5. Growth of Large-Scale and Thickness-Modulated MoS2 Nanosheets

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1. Highly Sustainable h‐BN Encapsulated MoS₂ Hydrogen Evolution Catalysts;Small;2024-08-15

2. Wafer‐Scale Demonstration of Polycrystalline MoS₂ Growth on 200 mm Glass and SiO₂/Si Substrates by Plasma‐Enhanced Atomic Layer Deposition;Advanced Materials Technologies;2024-07-12

3. Air-stable, all-dry transferred ReS2/GaSe heterostructure-based NO2 gas sensor;Journal of Materials Science & Technology;2024-01

4. First-principles study of the oxidation susceptibility of WS₂, WSe₂, and WTe₂ monolayers;Nanoscale;2024

5. Plasma Processing and Treatment of 2D Transition Metal Dichalcogenides: Tuning Properties and Defect Engineering;Chemical Reviews;2023-12-04

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