Atomic-Layer-Deposited Aluminum Oxide Thin Films Probed with X-ray Scattering and Compared to Molecular Dynamics and Density Functional Theory Models-Reference-Cited by-同舟云学术

Atomic-Layer-Deposited Aluminum Oxide Thin Films Probed with X-ray Scattering and Compared to Molecular Dynamics and Density Functional Theory Models

Published:2022-11-04 Issue:45 Volume:7 Page:41033-41043
ISSN:2470-1343
Container-title:ACS Omega
language:en
Short-container-title:ACS Omega

Author:

Pugliese Anthony¹,Shyam Badri²,Repa Gil M.³,Nguyen Anh Hung⁴^ORCID,Mehta Apurva⁵^ORCID,Webb III Edmund B.⁴,Fredin Lisa A.³,Strandwitz Nicholas C.¹^ORCID

Affiliation:

1. Materials Science and Engineering Department, Lehigh University, Bethlehem, Pennsylvania 18015, USA

2. Xerion Advanced Battery Corporation, Kettering, Ohio 45420, USA

3. Chemistry Department, Lehigh University, Bethlehem, Pennsylvania 18015, USA

4. Mechanical Engineering and Mechanics Department, Lehigh University, Bethlehem, Pennsylvania 18015, USA

5. SLAC National Accelerator Laboratory, Menlo Park, California 94025, USA

Funder

Lehigh University

Division of Civil, Mechanical and Manufacturing Innovation

Division of Chemical, Bioengineering, Environmental, and Transport Systems

Publisher

American Chemical Society (ACS)

Subject

General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acsomega.2c04402

Reference73 articles.

1. Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

2. Low‐Temperature Surface Passivation of Silicon for Solar Cells

3. Ca test of Al2O3 gas diffusion barriers grown by atomic layer deposition on polymers

4. Low-Temperature Al2O3 Atomic Layer Deposition

5. Physical and electrical properties of noncrystalline Al2O3 prepared by remote plasma enhanced chemical vapor deposition

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