Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF<sub>4</sub>/H<sub>2</sub> Plasma Reactive-Ion Etching-Reference-Cited by-同舟云学术

Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF₄/H₂ Plasma Reactive-Ion Etching

Published:2022-07-11 Issue:29 Volume:7 Page:25600-25612
ISSN:2470-1343
Container-title:ACS Omega
language:en
Short-container-title:ACS Omega

Author:

Ghezzi Francesco¹^ORCID,Pedroni Matteo¹,Kovač Janez²^ORCID,Causa Federica¹,Cremona Anna¹,Anderle Mariano¹,Caniello Roberto¹,Pietralunga Silvia M.³⁴,Vassallo Espedito¹

Affiliation:

1. Istituto per la Scienza e Tecnologia dei Plasmi CNR, Via R. Cozzi 53, Milano 20125, Italy

2. Jozef Stefan Institute, Jamova cesta 39, Ljubljana 1000, Slovenia

3. CNR, Istituto di Fotonica e Nanotecnologie, P.zza Leonardo da Vinci 32, Milan 20133, Italy

4. Center for Nano Science and Technology@PoliMi, IIT, Via G. Pascoli, 70/3, Milano 20133, Italy

Publisher

American Chemical Society (ACS)

Subject

General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acsomega.2c02740

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