TiO2 Coatings Via Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition for Enhancing the UV-Resistant Properties of Transparent Plastics
Author:
Affiliation:
1. Department of Chemical Engineering, Hiroshima University, Higashi-Hiroshima, Hiroshima 739-8527, Japan
Publisher
American Chemical Society (ACS)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.acs.org/doi/pdf/10.1021/acsomega.0c04999
Reference50 articles.
1. Preventing UV-light damage of light sensitive materials using a highly protective UV-absorbing coating
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3. Preparation of ZnO Thin Films Deposited by Plasma Chemical Vapor Deposition for Application to Ultraviolet-cut Coating
4. Investigation of vacuum deposited hybrid coatings of protic organic UV absorbers embedded in a silica matrix used for the UV protection of Polycarbonate glazing
5. Highly Anti-UV Properties of Silk Fiber with Uniform and Conformal Nanoscale TiO2 Coatings via Atomic Layer Deposition
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