Highly Anti-UV Properties of Silk Fiber with Uniform and Conformal Nanoscale TiO2 Coatings via Atomic Layer Deposition-Reference-Cited by-同舟云学术

Highly Anti-UV Properties of Silk Fiber with Uniform and Conformal Nanoscale TiO2 Coatings via Atomic Layer Deposition

Published:2015-09-21 Issue:38 Volume:7 Page:21326-21333
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Xiao Xingfang¹²,Liu Xin¹,Chen Fengxiang¹³,Fang Dong¹,Zhang Chunhua¹,Xia Liangjun¹,Xu Weilin¹²

Affiliation:

1. Key Laboratory of Green Processing and Functional Textiles of New Textile Materials, Ministry of Science and Technology, Wuhan Textile University, Wuhan 430073, P. R. China

2. College of Material Science and Engineering, Wuhan Institute of Technology, Wuhan 430073, P. R. China

3. Faculty of Materials Science and Engineering, Hubei University, Wuhan 430062, P. R. China

Funder

China National Funds for Distinguished Young Scientists

Ministry of Science and Technology of the People's Republic of China

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.5b05868

Reference33 articles.

1. Photochemical behaviour of natural silk—II. Mechanism of fibroin photodestruction

2. Tensile stress-strain and recovery behavior of Indian silk fibers and their structural dependence

3. Chemical assembly of TiO2 and TiO2@Ag nanoparticles on silk fiber to produce multifunctional fabrics

4. Cotton fabric surface modification for improved UV radiation protection using sol–gel process

5. Preparation of the silk fabric with ultraviolet protection and yellowing resistance using TiO2/La(III) composite nanoparticles

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