Structural, Optical, and Electrical Properties of Hafnium–Aluminum–Zinc-Oxide Films Grown by Atomic Layer Deposition for TCO Applications
Author:
Affiliation:
1. Faculty of Physics, University of Warsaw, 02-093 Warsaw, Poland
Funder
Uniwersytet Warszawski
Publisher
American Chemical Society (ACS)
Subject
General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acsomega.3c04256
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