Microlithographic Assessment of a Novel Family of Transparent and Etch-Resistant Chemically Amplified 193-nm Resists Based on Cyclopolymers
Author:
Affiliation:
1. Department of Chemistry, University of California, Berkeley, California 94720-1460, and Division of Material Sciences, Lawrence Berkeley National Laboratory, Berkeley, California
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm010431w
Reference26 articles.
1. Unconventional Methods for Fabricating and Patterning Nanostructures
2. Organic imaging materials: a view of the future
3. Organic Materials Challenges for 193 nm Imaging
4. Alicyclic Polymers for 193 nm Resist Applications: Lithographic Evaluation
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