Microlithographic Assessment of a Novel Family of Transparent and Etch-Resistant Chemically Amplified 193-nm Resists Based on Cyclopolymers-Reference-Cited by-同舟云学术

Microlithographic Assessment of a Novel Family of Transparent and Etch-Resistant Chemically Amplified 193-nm Resists Based on Cyclopolymers

Published:2001-10-09 Issue:11 Volume:13 Page:4147-4153
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Klopp John M.¹,Pasini Dario¹,Byers Jeffrey D.¹,Willson C. Grant¹,Fréchet Jean M. J.¹

Affiliation:

1. Department of Chemistry, University of California, Berkeley, California 94720-1460, and Division of Material Sciences, Lawrence Berkeley National Laboratory, Berkeley, California

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm010431w

Reference26 articles.

1. Unconventional Methods for Fabricating and Patterning Nanostructures

2. Organic imaging materials: a view of the future

3. Organic Materials Challenges for 193 nm Imaging

4. Alicyclic Polymers for 193 nm Resist Applications: Lithographic Evaluation

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