Effects of Surface Properties of Different Substrates on Fine Structure of Plasma-Polymerized SiOCH Films Prepared from Hexamethyldisiloxane (HMDSO)-Reference-Cited by-同舟云学术

Effects of Surface Properties of Different Substrates on Fine Structure of Plasma-Polymerized SiOCH Films Prepared from Hexamethyldisiloxane (HMDSO)

Published:2010-10-08 Issue:22 Volume:26 Page:17470-17476
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Lo Chia-Hao¹,Liao Kuo-Sung¹,De Guzman Manuel¹,Rouessac Vincent²,Wei Ta-Chin¹,Lee Kueir-Rarn¹,Lai Juin-Yih¹

Affiliation:

1. R&D Center for Membrane Technology, Department of Chemical Engineering, Chung Yuan University, Chung-Li 32023, Taiwan

2. Institut Européen des Membranes- ENSCM/UM2/CNRS UMR5635, Université Montpellier 2-CC047, 2 Place Eugène Bataillon, 34095 Montpellier cedex 5, France

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la102759b

Reference24 articles.

1. Polyamide thin-film composite membranes prepared by interfacial polymerization for pervaporation separation

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5. Preparation of oxygen gas barrier poly(ethylene terephthalate) films by deposition of silicon oxide films plasma-polymerized from a mixture of tetramethoxysilane and oxygen

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