Description and Test of a New Multilayer Thin Film Vapor Deposition Apparatus for Organic Semiconductor Materials-Reference-Cited by-同舟云学术

Description and Test of a New Multilayer Thin Film Vapor Deposition Apparatus for Organic Semiconductor Materials

Published:2015-11-24 Issue:12 Volume:60 Page:3776-3791
ISSN:0021-9568
Container-title:Journal of Chemical & Engineering Data
language:en
Short-container-title:J. Chem. Eng. Data

Author:

Costa José C. S.¹²,Rocha Rui M.³,Vaz Inês C. M.¹,Torres Manuel C.¹,Mendes Adélio²,Santos Luís M. N. B. F.¹

Affiliation:

1. CIQ − Centro de Investigação em Química, Departamento de Química e Bioquímica, Faculdade de Ciências da Universidade do Porto, Rua do Campo Alegre, 687, P-4169-007 Porto, Portugal

2. LEPABE − Laboratory for Process Engineering, Environment, Biotechnology and Energy, Faculdade de Engenharia, Universidade do Porto, Rua Dr. Roberto Frias, P-4200-465 Porto, Portugal

3. CEMUP − Centro de Materiais da Universidade do Porto, Rua do Campo Alegre, 823, P-4150-180 Porto, Portugal

Funder

Funda??o para a Ci?ncia e a Tecnologia

European Social Fund

Publisher

American Chemical Society (ACS)

Subject

General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jced.5b00708

Reference63 articles.

1. Chemical vapor deposition of metals: Part 1. An overview of CVD processes

2. Large Area, Few-Layer Graphene Films on Arbitrary Substrates by Chemical Vapor Deposition

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