A SSIMS and TPD Study of tert-Butylacetylacetate Adsorption on Si(100)
Author:
Affiliation:
1. Department of Chemistry, National Taiwan University, 1 Roosevelt Rd., Sec. 4, Taipei, Taiwan, R.O.C. 10617
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp002660w
Reference73 articles.
1. Kodas, T.; Hampden-Smith, M. J.; Eds.The Chemistry of Metal CVD, VCH Publishers Inc. Weinheim, Germany, 1994.
2. Ho, P. S.; d'Heurle, F. M.; Gangulee, A.Electro- and Thermo-Transportin Metals and Alloys; Hummel, R. E., Huntington, H. B., Eds.; American Institute of Mining, Metallurgical, and Petroleum Engineers: New York, 1977; pp 124−126.
3. Kinetics of sublimation of copper(II) acetylacetonate complex used for chemical vapor deposition of copper films
4. Plasma-Enhanced Chemical Vapor Deposition of Copper
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