A SSIMS and TPD Study of tert-Butylacetylacetate Adsorption on Si(100)

Author:

Chang Che-Chen1,Huang Ing-Jye1,Lung Chien-Hua1,Hwang Hsin-Yen1,Teng Lu-Yu1

Affiliation:

1. Department of Chemistry, National Taiwan University, 1 Roosevelt Rd., Sec. 4, Taipei, Taiwan, R.O.C. 10617

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Reference73 articles.

1. Kodas, T.; Hampden-Smith, M. J.; Eds.The Chemistry of Metal CVD, VCH Publishers Inc.  Weinheim, Germany, 1994.

2. Ho, P. S.; d'Heurle, F. M.; Gangulee, A.Electro- and Thermo-Transportin Metals and Alloys; Hummel, R. E., Huntington, H. B., Eds.; American Institute of Mining, Metallurgical, and Petroleum Engineers:  New York, 1977; pp 124−126.

3. Kinetics of sublimation of copper(II) acetylacetonate complex used for chemical vapor deposition of copper films

4. Plasma-Enhanced Chemical Vapor Deposition of Copper

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