Guided Self-Assembly of Symmetric Diblock Copolymer Films on Chemically Nanopatterned Substrates-Reference-Cited by-同舟云学术

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Guided Self-Assembly of Symmetric Diblock Copolymer Films on Chemically Nanopatterned Substrates

Published:2000-12-01 Issue:26 Volume:33 Page:9575-9582
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Yang Xiao M.,Peters Richard D.,Nealey Paul F.,Solak Harun H.,Cerrina Franco

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ma001326v

Reference47 articles.

1. Lithography with a mask of block copolymer microstructures

2. Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter

3. Block Copolymer Thermodynamics: Theory and Experiment

4. Polymer-Polymer Phase Behavior

5. Reducing Substrate Pinning of Block Copolymer Microdomains with a Buffer Layer of Polymer Brushes

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1. Directed Self-Assembly of Binary AB/AB Diblock Copolymer Blends for Dense Nanopatterns with Density Multiplication;Macromolecules;2024-05-15

2. A Universal Approach to Fabricating 3D Chemical Patterns for Directed Self-Assembly of Block Copolymers with Density Multiplication;Macromolecules;2023-07-26

3. Direct Visualization of the Self-Alignment Process for Nanostructured Block Copolymer Thin Films by Transmission Electron Microscopy;ACS Macro Letters;2023-04-13

4. Controlled Orientation of Silicon-Containing Diblock Copolymer Thin Films by Substrate Functionalization Under Vacuum;Macromolecules;2023-01-16

5. Responsive blends of block copolymers stabilize the hexagonally perforated lamellae morphology;Soft Matter;2023

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