Patterning Polymeric Structures with 2 nm Resolution at 3 nm Half Pitch in Ambient Conditions-Reference-Cited by-同舟云学术

Patterning Polymeric Structures with 2 nm Resolution at 3 nm Half Pitch in Ambient Conditions

Published:2007-03-13 Issue:7 Volume:7 Page:1846-1850
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Martínez R. V.¹,Losilla N. S.¹,Martinez J.¹,Huttel Y.¹,Garcia R.¹

Affiliation:

1. Instituto de Microelectrónica de Madrid, CSIC Isaac Newton 8, 28760 Tres Cantos, Madrid, Spain, and Instituto de Ciencia de Materiales de Madrid, CSIC Cantoblanco, 28049 Madrid, Spain

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl070328r

Reference30 articles.

1. Sotomayor Torres, C. M.Alternative Lithography: Unleasing Potentialsof Nanotechnology; Nanostructure Science and Technology; Kluwer Academic/Plenum Publishers: New York 2003.

2. UNCONVENTIONAL NANOFABRICATION

3. Patterning: Principles and Some New Developments

4. In touch with atoms

5. Langmuir−Blodgett Nanorod Assembly

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