Catalytic and Autocatalytic Mechanisms of Acid Amplifiers for Use in EUV Photoresists
Author:
Affiliation:
1. College of Nanoscale Science and Engineering, University at Albany, Albany, New York 12203
2. Intel Corporation, Hillsboro, Oregon 97124
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm101867g
Reference24 articles.
1. Environmentally stable chemical amplification positive resist: principle, chemistry, contamination resistance, and lithographic feasibility.
2. Measuring line roughness through aerial image contrast variation using coherent extreme ultraviolet spatial filtering techniques
3. Shot noise, LER, and quantum efficiency of EUV photoresists
4. Nonlinear organic reactions to proliferate acidic and basic molecules and their applications
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