Micro- and Submicrostructuring Thin Polymer Films with Two and Three-Beam Single Pulse Laser Interference Lithography
Author:
Affiliation:
1. Instituto de Estructura de la Materia (IEM-CSIC), Serrano 121, 28006 Madrid, Spain
2. University of Konstanz, Fach 676, 78457 Konstanz, Germany
3. Instituto de Óptica (IO−CSIC), Serrano 121, 28006 Madrid, Spain
Funder
Ministerio de Economía y Competitividad
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/la5021059
Reference30 articles.
1. Laser-Ablation Growth and Optical Properties of Wide and Long Single-Crystal SnO2 Ribbons
2. Femtosecond laser micromachining in transparent materials
3. Diffractive grey-tone phase masks for laser ablation lithography
4. Three-beam interference lithography: upgrading a Lloyd's interferometer for single-exposure hexagonal patterning
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