Dual Patterning of a Poly(acrylic acid) Layer by Electron-Beam and Block Copolymer Lithographies
Author:
Affiliation:
1. Departments of †Physics and Astronomy, ‡Chemistry and Biochemistry, and §Chemical Engineering, Brigham Young University, Provo, Utah
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/la304486x
Reference37 articles.
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4. Large-area spatially ordered arrays of gold nanoparticles directed by lithographically confined DNA origami
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