Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography-Reference-Cited by-同舟云学术

Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography

Published:2016-08-18 Issue:34 Volume:8 Page:22705-22713
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Chang Tongxin¹²,Du Binyang³,Huang Haiying¹²,He Tianbai¹²

Affiliation:

1. State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, P. R. China

2. University of Chinese Academy of Sciences, Beijing 100039, P. R. China

3. MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, and Department of Chemistry, Zhejiang University, Hangzhou 310027, P. R. China

Funder

National Natural Science Foundation of China

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.6b07730

Reference56 articles.

1. Self-Propelled Micro-/Nanomotors Based on Controlled Assembled Architectures

2. Submicrometer Patterning of Charge in Thin-Film Electrets

3. Fabrication of RGD Micro/Nanopattern and Corresponding Study of Stem Cell Differentiation