Dual Mode Patterning of Fluorine-Containing Block Copolymers through Combined Top-down and Bottom-up Lithography-Reference-Cited by-同舟云学术

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Dual Mode Patterning of Fluorine-Containing Block Copolymers through Combined Top-down and Bottom-up Lithography

Published:2012-04-02 Issue:8 Volume:24 Page:1454-1461
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Maeda Rina¹,Hayakawa Teruaki¹,Ober Christopher K.²

Affiliation:

1. Department of Organic and Polymeric Materials, Tokyo Institute of Technology, 2-12-1-S8-36 Ookayama, Meguro-ku, Tokyo 152-8552, Japan

2. Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853-1501, United States

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm300093e

Reference35 articles.

1. Polymer self assembly in semiconductor microelectronics

2. Nanoscopic Templates from Oriented Block Copolymer Films

3. Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays

4. Templating Nanoporous Polymers with Ordered Block Copolymers

5. Macroscopic 10-Terabit–per–Square-Inch Arrays from Block Copolymers with Lateral Order

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4. Investigation of Bluk and Thin-film Self-assembly Using Discrete Fluorine-containing Block Copolymers;ACTA POLYM SIN;2024

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