Temperature dependence of the reactivity of hydroxyl(X2II) with oxidized silicon nitride and PMMA film surfaces-Reference-Cited by-同舟云学术

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Temperature dependence of the reactivity of hydroxyl(X2II) with oxidized silicon nitride and PMMA film surfaces

Published:1993-10 Issue:40 Volume:97 Page:10287-10294
ISSN:0022-3654
Container-title:The Journal of Physical Chemistry
language:en
Short-container-title:J. Phys. Chem.

Author:

Fisher Ellen R.,Ho Pauline,Breiland William G.,Buss Richard J.

Publisher

American Chemical Society (ACS)

Subject

Physical and Theoretical Chemistry,General Engineering

Link

https://pubs.acs.org/doi/pdf/10.1021/j100142a006

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