Cyclic Block Copolymers for Controlling Feature Sizes in Block Copolymer Lithography

Author:

Poelma Justin E.12,Ono Kosuke13,Miyajima Daigo14,Aida Takuzo4,Satoh Kotaro15,Hawker Craig J.126

Affiliation:

1. Materials Research Laboratory, University of California, Santa Barbara, California 93106, United States

2. Materials Department, University of California, Santa Barbara, California 93106, United States

3. Department of Chemistry, Tokyo Institute of Technology, 2-12-1, O-okayama, Meguro-ku, Tokyo 152-8551 Japan

4. Department of Chemistry and Biotechnology, The University of Tokyo, Tokyo, Japan

5. Department of Applied Chemistry, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

6. Department of Chemistry and Biochemistry, University of California, Santa Barbara 93106, United States

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

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