Heteroepitaxy of High-Mobility Germanium on Sapphire (0001) with Magnetron Sputtering
Author:
Affiliation:
1. Department of Physics, Applied Physics, and Astronomy and Center for Materials, Devices, and Integrated Systems (cMDIS), Rensselaer Polytechnic Institute, Troy, New York 12180, United States
Funder
New York State Foundation of Science, Technology and Innovation
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acsaelm.0c00219
Reference42 articles.
1. Investigation of crystallized germanium thin films and germanium/silicon heterojunction devices for optoelectronic applications
2. Germanium: Epitaxy and its applications
3. van der Waals epitaxy of Ge films on mica
4. Characterization of Rapid Melt Growth (RMG) Process for High Quality Thin Film Germanium on Insulator
5. Germanium on sapphire substrates for system on a chip
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1. High-Quality Single-Step Growth of GaAs on C-Plane Sapphire by Molecular Beam;Crystals;2024-08-14
2. Substrate-dependent carrier mobility in polycrystalline Ge thin films;Materials Today Communications;2024-08
3. Single crystalline Ge thin film growth on c-plane sapphire substrates by molecular beam epitaxy (MBE);CrystEngComm;2022
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