Plasma Treatment of Ultrathin Layered Semiconductors for Electronic Device Applications-Reference-Cited by-同舟云学术

Plasma Treatment of Ultrathin Layered Semiconductors for Electronic Device Applications

Published:2021-04-07 Issue:4 Volume:3 Page:1505-1529
ISSN:2637-6113
Container-title:ACS Applied Electronic Materials
language:en
Short-container-title:ACS Appl. Electron. Mater.

Author:

Jadwiszczak Jakub¹^ORCID,Kelly Daniel J.²,Guo Junqing³,Zhou Yangbo³^ORCID,Zhang Hongzhou⁴^ORCID

Affiliation:

1. Department of Electrical Engineering, Columbia University, 500 West 120th Street, New York, New York 10027, United States

2. DTU Nanolab, Technical University of Denmark, Fysikvej, 2800 Lyngby, Denmark

3. School of Materials Science and Engineering, Nanchang University, 999 Xuefu Road, Nanchang, Jiangxi 330031, China

4. School of Physics, Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and Advanced Materials and Bioengineering Research (AMBER) Research Centers, Trinity College Dublin, Dublin 2, Ireland

Funder

Leverhulme Trust

Science Foundation Ireland

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acsaelm.0c00901

Reference253 articles.

1. Emerging Device Applications for Semiconducting Two-Dimensional Transition Metal Dichalcogenides

2. Electronics based on two-dimensional materials

3. Electrical contacts to two-dimensional semiconductors

4. Single-Layer MoS2 Electronics

5. Van der Waals heterostructures and devices

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