Spatially Controlled Generation and Probing of Random Telegraph Noise in Metal Nanocrystal Embedded HfO2 Using Defect Nanospectroscopy

Author:

Ranjan Alok1ORCID,Puglisi Francesco Maria2ORCID,Molina-Reyes Joel3ORCID,Pavan Paolo2,O’Shea Sean J.4ORCID,Raghavan Nagarajan1ORCID,Pey Kin Leong1ORCID

Affiliation:

1. Engineering Product Development, Singapore University of Technology and Design, 8 Somapah Road, Singapore 487 372

2. DIEF − Università di Modena e Reggio Emilia, Via P. Vivarelli 10/1, Modena 41125, Italy

3. Electronics Department, National Institute of Astrophysics, Optics and Electronics, Puebla 72840, Mexico

4. Institute of Materials Research and Engineering, Agency for Science Technology and Research, 2 Fusionopolis Way, Singapore 138 634

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials

Reference62 articles.

1. Tega, N.; Miki, H.; Pagette, F.; Frank, D. J.; Ray, A.; Rooks, M. J.; Haensch, W., Torii, K. Increasing threshold voltage variation due to random telegraph noise in FETs as gate lengths scale to 20 nm. 2009 Symposium on VLSI Technology 2009, pp 50–51.

2. (Invited) Random Telegraph Noise: From a Device Physicist's Dream to a Designer's Nightmare

3. Raghavan, N.; Degraeve, R.; Goux, L.; Fantini, A.; Wouters, D. J.; Groeseneken, G.; Jurczak, M. RTN insight to filamentary instability and disturb immunity in ultra-low power switching HfOx and AlOx RRAM. 2013 Symposium on VLSI Technology 2013, pp T164–T165.

4. Probing Cu doped Ge0.3Se0.7 based resistance switching memory devices with random telegraph noise

5. Reliability of analog resistive switching memory for neuromorphic computing

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