Deep-UV-Enhanced Approach for Low-Temperature Solution Processing of IZO Transistors with High-k AlOx/YAlOx Dielectric
Author:
Affiliation:
1. Soft Transducers Laboratory, Ecole Polytechnique Fédérale de Lausanne, 2000 Neuchâtel, Switzerland
2. Empa-Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland
Funder
Eidgen?ssische Technische Hochschule Z?rich
Schweizerischer Nationalfonds zur F?rderung der Wissenschaftlichen Forschung
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acsaelm.0c00444
Reference58 articles.
1. Materials capability and device performance in flexible electronics for the Internet of Things
2. Wafer-scale design of lightweight and transparent electronics that wraps around hairs
3. Wearable, Flexible, and Multifunctional Healthcare Device with an ISFET Chemical Sensor for Simultaneous Sweat pH and Skin Temperature Monitoring
4. Power saving through state retention in IGZO-TFT AMOLED displays for wearable applications
5. Review of metal oxide semiconductors-based thin-film transistors for point-of-care sensor applications
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